| 书目名称 | Scanning Probe Lithography | | 编辑 | Hyongsok T. Soh,Kathryn Wilder Guarini,Calvin F. Q | | 视频video | | | 丛书名称 | Microsystems | | 图书封面 |  | | 描述 | .Scanning Probe Lithography. (SPL) describes recentadvances in the field of scanning probe lithography, a high resolutionpatterning technique that uses a sharp tip in close proximity to asample to pattern nanometer-scale features on the sample. SPL iscapable of patterning sub-30nm features with nanometer-scale alignmentregistration. It is a relatively simple, inexpensive, reliable methodfor patterning nanometer-scale features on various substrates. It haspotential applications for nanometer-scale research, for masklesssemiconductor lithography, and for photomask patterning. .The authors of this book have been key players in this exciting newfield.Calvin Quate has been involved since the beginning in theearly 1980s and leads the research time that is regarded as theforemost group in this field.Hyongsok Tom Soh and Kathryn WilderGuarini have been the members of this group who, in the last fewyears, have brought about remarkable series of advances in SPMlithography.Some of these advances have been in the control of thetip which has allowed the scanning speed to be increased frommum/second to mm/second.Both non-contact and in-contact writinghave been demonstrated as has controlled writ | | 出版日期 | Book 2001 | | 关键词 | Leistungsfeldeffekttransistor; MOSFET; Potential; electrons; field-effect transistor; manufacturing; metal | | 版次 | 1 | | doi | https://doi.org/10.1007/978-1-4757-3331-0 | | isbn_softcover | 978-1-4419-4894-6 | | isbn_ebook | 978-1-4757-3331-0Series ISSN 1389-2134 | | issn_series | 1389-2134 | | copyright | Springer Science+Business Media New York 2001 |
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发表于 2025-3-21 16:18:11
