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Titlebook: Introduction to Focused Ion Beams; Instrumentation, The Lucille A. Giannuzzi,Fred A. Stevie Book 2005 Springer-Verlag US 2005 SIMS.instrume

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Kultaransingh Bobby N. Hooghane large current transients in the power delivery system, resulting in V. droop and overshoot fluctuations. The magnitude and duration of V. droops and overshoots depend on the interaction of capacitive and inductive parasitics at the board, package, and die levels with changes in current demand [1].
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Becky Holdfordessive scaling is reaching its limits and the control of semiconductor manufacturing process is becoming increasingly difficult. Variations in manufacturing process have grown, and variations in device parameters have grown even more, resulting in wider distributions which, in turn, could result in
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Peter Gnauck,Peter Hoffrogge,M. Schumannessive scaling is reaching its limits and the control of semiconductor manufacturing process is becoming increasingly difficult. Variations in manufacturing process have grown, and variations in device parameters have grown even more, resulting in wider distributions which, in turn, could result in
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L. A. Giannuzzi,B. W. Kempshall,S. M. Schwarz,J. K. Lomness,B. I. Prenitzer,F. A. Stevieas organized by the Open Research Society, NGO, http://www.open-knowledge-society.org, and took place in the American College of Greece, http://www.acg.gr, during September 24–27, 2008, in Athens, Greece. The World Summit on the Knowledge Society Series is an international attempt to promote a dialo
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ve solutions within their curricula. At the same time, Augmented reality (AR) is an emerging technology in the Immersive Learning Landscape. The EU-funded Erasmus + project Enlivened Laboratories in STEM (EL-STEM) aims to introduce a new approach, through the provision of integrated inquiry-based ST
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978-1-4419-3574-8Springer-Verlag US 2005
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FIB for Materials Science Applications - a Review,The application of focused ion beam techniques to a range of topics in materials science is reviewed. Recent examples in the literature are cited along with illustrations of numerous applications. Potential artifacts that can arise are discussed along with commentary on minimizing their impact.
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