Titlebook: Crucial Issues in Semiconductor Materials and Processing Technologies; S. Coffa,F. Priolo,J. M. Poate Book 1992 Springer Science+Business

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书目名称Crucial Issues in Semiconductor Materials and Processing Technologies影响因子(影响力)




书目名称Crucial Issues in Semiconductor Materials and Processing Technologies影响因子(影响力)学科排名




书目名称Crucial Issues in Semiconductor Materials and Processing Technologies网络公开度




书目名称Crucial Issues in Semiconductor Materials and Processing Technologies网络公开度学科排名




书目名称Crucial Issues in Semiconductor Materials and Processing Technologies被引频次




书目名称Crucial Issues in Semiconductor Materials and Processing Technologies被引频次学科排名




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书目名称Crucial Issues in Semiconductor Materials and Processing Technologies年度引用学科排名




书目名称Crucial Issues in Semiconductor Materials and Processing Technologies读者反馈




书目名称Crucial Issues in Semiconductor Materials and Processing Technologies读者反馈学科排名

身体萌芽

Optoelectronic Materialsd to alloys. An insight is given on recent developments: strained epilayers and quantum wells. We then review the materials of interest for optoelectronic devices and detail those related to telecommunication applications, especially the InGaAsP and InGaAlAs quaternary systems.

licence

Electrical Characteristics of PECVD Silicon Nitride / Compound Semiconductor Interfaces for Optoelecrmal annealing in nitrogen were also shown. The experimental data can be interpreted in terms of the contributions of insulator-related structural defects and semiconductor-related defects induced by the plasma deposition process on the crystal surface.

人造

Fundamentals of Semiconductor Processing defining the ultimate limits in feature size, compositional and structural heterogeneity, and device performance. Particular emphasis is given to silicon technology which dominates both the science and economics of the electronics industry.

Conclave

长处

长处

Paul Humphries,Alison J. King,John D. Koehnamination. The nature of those defects, their electrical effects, their formation mechanisms and precautions for their prevention are discussed. Analytical methods for the characterization and monitoring of crystal defects and metal contamination are described.

harmony

Fourier and Fourier-Mehler Transforms, has been considered for two new applications : i) Formation of ultra-shallow junctions in silicon using selectively deposited and implanted polycrystalline Si.Ge. as a diffusion source, ii) Formation of MOS gate structures with Si.Ge. gate electrodes for lower dopant activation temperatures and better threshold control.

金丝雀

Defect Aspects of Advanced Device Technologiesamination. The nature of those defects, their electrical effects, their formation mechanisms and precautions for their prevention are discussed. Analytical methods for the characterization and monitoring of crystal defects and metal contamination are described.

Excise