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Titlebook: Amorphous and Crystalline Silicon Carbide IV; Proceedings of the 4 Cary Y. Yang,M. Mahmudur Rahman,Gary L. Harris Conference proceedings 19

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期刊全称Amorphous and Crystalline Silicon Carbide IV
期刊简称Proceedings of the 4
影响因子2023Cary Y. Yang,M. Mahmudur Rahman,Gary L. Harris
视频video
学科分类Springer Proceedings in Physics
图书封面Titlebook: Amorphous and Crystalline Silicon Carbide IV; Proceedings of the 4 Cary Y. Yang,M. Mahmudur Rahman,Gary L. Harris Conference proceedings 19
影响因子Silicon carbide and other group IV-IV materials in theiramorphous, microcrystalline, and crystalline forms have awide variety of applications.The contributions to thisvolume report recent developments and trends in the field.The purpose is to make available the current state ofunderstanding of the materials and their potentialapplications. Eachcontribution focuses on a particulartopic, such as preparation methods,characterization, andmodels explaining experimental findings. The volume alsocontains the latest results in the exciting field of SiGe/Siheterojunction bipolar transistors.The reader will find this book valuable as a referencesource, an up-to-date and in-depth overview of this field,and, most importantly, as a window into the immense range ofreading potential applications of silicon carbide. It isessential for scientists, engineers and students interestedin electronic materials,high-speed heterojunction devices,and high-temperature optoelectronics.
Pindex Conference proceedings 19921st edition
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https://doi.org/10.1007/978-3-642-84804-9SiGe; band structure; crystal; development; diodes; electron; electronic material; hydrogen; laser; material;
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https://doi.org/10.1007/978-3-662-28982-2ilms on vicinal (0001) 6H-SiC wafers. Processes based on this new understanding have been developed. For example, 3C-SiC and 6H-SiC films were grown on separate 1-mm-square mesas on the same 6H-SiC substrate. Most of the 3C films were free of double positioning boundaries (DPBs), and had a reduced d
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https://doi.org/10.1007/978-3-662-31626-9th of 6H-SiC is achieved at a temperature as low as 1200°C governed by step-flowgrowth on off-oriented {0001} faces and at 1100°C on (0.1.)C faces. The activation energy of growth rate shows a very small value of 3.0kcal/mole. This can be quantitatively analyzed on the basis of a stagnant layer mode
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https://doi.org/10.1007/978-3-662-31626-9.. The crystallinity of the grown SiC layer is influenced by orientation of Si substrates. A single crystalline 3C-SiC has been grown on Si(111) face, while a polycrystalline 3C-SiC on Si (001) face. A growth rate of SiC with alternate gas supply is almost 3 ML/cycle and independent of the duration
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