| 书目名称 | Ultraclean Surface Processing of Silicon Wafers |
| 副标题 | Secrets of VLSI Manu |
| 编辑 | Takeshi Hattori |
| 视频video | |
| 概述 | Handbook on most advanced technologies in surface processing of silicon wafers. |
| 图书封面 |  |
| 描述 | A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices. |
| 出版日期 | Book 1998 |
| 关键词 | Technologie; VLSI; production; quality; semiconductor devices |
| 版次 | 1 |
| doi | https://doi.org/10.1007/978-3-662-03535-1 |
| isbn_softcover | 978-3-642-08272-6 |
| isbn_ebook | 978-3-662-03535-1 |
| copyright | Springer-Verlag Berlin Heidelberg 1998 |
发表于 2025-3-21 18:50:18
