Titlebook: Surface Science; An Introduction K. Oura,M. Katayama,A. A. Saranin Textbook 2003 Springer-Verlag Berlin Heidelberg 2003 Adsorption.Diffusio

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Elementary Processes at Surfaces II. Surface Diffusion,adient of the chemical potential), the random walk motion of many particles results in their net diffusion motion in the direction opposite to the direction of the gradient. The diffusion process is affected by many factors, such as interaction between diffusing adspecies, formation of surface phases, presence of defects, etc.

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Introduction,h there were many previous studies of surface phenomena, and many basic theoretical concepts had already been developed (for details see, for example, [1.1, 1.2]). The breakthrough in the field resulted from a combination of factors, including progress in vacuum technology, the development of surfac

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Experimental Background, justified. Then, vacuum concepts are briefly considered before introducing UHV technology. Finally, the main experimental techniques for the preparation of atomically clean surfaces and the deposition of materials are discussed.

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Ancillary

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Magisterial

Atomic Structure of Clean Surfaces,importance. It appears that the majority of surfaces, especially those of semiconductors, are essentially modified with respect to the corresponding atomic planes in the bulk. In this chapter, the general types of such modifications, called relaxation and reconstruction, are first introduced and the

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Atomic Structure of Surfaces with Adsorbates,s on which a controlled amount of certain foreign atoms or molecules are intentionally added. The foreign species can be added to the surface in different ways, including condensation from vapor phase (.), segregation from the sample bulk, or diffusion along the surface. Taking into account that ads

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Elementary Processes at Surfaces I. Adsorption and Desorption,rms (for example, adsorbate, substrate, physisorption, chemisorption, coverage) have been introduced. However, there the final result of the adsorption/desorption process has been discussed, not the process itself. The latter is the subject of the present chapter, in which adsorption/desorption phen