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Titlebook: Strain-Induced Effects in Advanced MOSFETs; Viktor Sverdlov Book 2011 Springer-Verlag/Wien 2011 semiconductor devices.strain technique.tra

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Electron Subbands in Silicon in the Effective Mass Approximation, applying an appropriate voltage to the gate electrode. In this case a potential well at the oxide interface in silicon is formed. The charge carriers are confined in this potential well. Charge carriers are free to move along the interface .=(.,.) and the wave function along the interface can be ta
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Demands of Transport Modeling in Advanced MOSFETs,ster and assembling more and more elements on a chip, This is achieved by scaling the MOSFET size down. In the past decade the minimum feature size of transistor has been successfully reduced which allowed to double the number of transistors on a chip every second year. This trend is expected to con
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0179-0307 w of transport modeling in strain devices.Includes supplemenStrain is used to boost performance of MOSFETs. Modeling of strain effects on transport is an important task of modern simulation tools required for device design. The book covers all relevant modeling approaches used to describe strain in
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Viktor Sverdlov income as well as those based on age, sex, disability, race, ethnicity, origin, religion or economic or other status within a country. The Goal also addresses inequalities among countries, including those rela978-3-319-95882-8Series ISSN 2523-7403 Series E-ISSN 2523-7411
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Viktor Sverdlov income as well as those based on age, sex, disability, race, ethnicity, origin, religion or economic or other status within a country. The Goal also addresses inequalities among countries, including those rela978-3-319-95882-8Series ISSN 2523-7403 Series E-ISSN 2523-7411
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