| 书目名称 | Silicon-on-Insulator Technology | | 副标题 | Materials to VLSI | | 编辑 | Jean-Pierre Colinge | | 视频video | | | 图书封面 |  | | 描述 | .Silicon-on-Insulator Technology: Materials to VLSI, 2ndEdition. describes the different facets of SOI technology. SOI chipsare now commercially available and SOI wafer manufacturers have gonepublic. SOI has finally made it out of the academic world and is now abig concern for every major semiconductor company. SOI technology hasindeed deserved serious recognition: high-temperature (400°C),extremely rad-hard (500 Mrad(Si)), high-density (16 Mb, 0.9-voltDRAM), high-speed (several GHz) and low-voltage (0.5 V) SOI circuitshave been demonstrated. Strategic choices in favor of the use of SOIfor low-voltage, low-power portable systems have been made by severalmajor semiconductor manufacturers. ..Silicon-on-Insulator Technology: Materials to VLSI, 2nd Edition.presents a complete and state-of-the-art review of SOI materials,devices and circuits. SOI fabrication and characterization techniques,SOI device processing, the physics of the SOI MOSFET as well as thatof SOI other devices, and the performances of SOI circuits arediscussed in detail. .The SOI specialist will find this book invaluable as a source ofcompiled references covering the different aspects of SOI technology.For the non-speci | | 出版日期 | Book 1997Latest edition | | 关键词 | CMOS; DRAM; Leistungsfeldeffekttransistor; RAM; VLSI; field-effect transistor; metal oxide semiconductur f | | 版次 | 2 | | doi | https://doi.org/10.1007/978-1-4757-2611-4 | | isbn_ebook | 978-1-4757-2611-4 | | copyright | Springer-Verlag US 1997 |
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发表于 2025-3-21 18:19:00
