Titlebook: Secondary Ion Mass Spectrometry SIMS IV; Proceedings of the F A. Benninghoven,J. Okano,H. W. Werner Conference proceedings 1984 Springer-Ve

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Fundamentals of Sputtering and P an ionization probability. As we all know, things are more complex. As a next step, one could write schematically.where x stands for a set of bombardment parameters (ion type, energy, angle of incidence etc.), y for the detected signal (mass, charge, energy etc. of the emitted ion), and z for

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Outermost Surface Composition of Au-Cu Alloys Under Ion Bombardment of Different Current Densities olization process, the exact knowledge of the surface composition of the outermost atomic layer under ion bombardment is needed. With respect to the surface composition of alloy samples under Ar. ion bombardment, it is now well recognized that the ion-enhanced subsurface re-distribution results in a

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Molecular Dynamics Computer Simulation Study of the Damage Produced in Metal Target Surfaces During es [6] has been extended to cool and recrystallize the target. The target’s response is physically plausible, and its final configuration is consistent with transmission electron microscope (TEM) studies of ion-bombarded target surfaces. Here the chief emphasis will be placed on effects which influe