Titlebook: Reactive Sputter Deposition; Diederik Depla,Stijn Mahieu Book 2008 Springer-Verlag Berlin Heidelberg 2008 Helium-Atom-Streuung.Magnetron d

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Oxide-Based Electrochromic Materials and Devices Prepared by Magnetron Sputtering,rtance. More and more energy is used to maintain this environment at a level that is both comfortable and healthy. Looking at the EU(15), some 40% of the energy supply are currently used for heating, cooling, ventilation, and lighting of buildings, as well as for appliances. In financial terms, this

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Basal-Ganglia

https://doi.org/10.1007/978-3-540-76664-3Helium-Atom-Streuung; Magnetron discharge modelling; Physical vapour deposition; Plasma characterizatio

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Diederik Depla,Stijn MahieuCovers all the sputtering techniques for thin-film deposition.Describes the physical basics and related technical realization.Gives advice on controlling the sputter process and quality of the layers

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Cpap155

Reactive Sputter Deposition978-3-540-76664-3Series ISSN 0933-033X Series E-ISSN 2196-2812

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0933-033X ite straightforward, a complete understanding of the magnetron discharge and the in?uence of di?erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,the978-3-642-09536-8978-3-540-76664-3Series ISSN 0933-033X Series E-ISSN 2196-2812

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Defiance

Electron Emission from Surfaces Induced by Slow Ions and Atoms,e surface. The collisions are either elastic scattering with atomic cores, which cause large deflections in trajectories, or energy loss collisions by scattering with other electrons, contingent on the availability of electronic states. As a result of such inelastic scattering, the electrons which s