Titlebook: Reactive Sputter Deposition; Diederik Depla,Stijn Mahieu Book 2008 Springer-Verlag Berlin Heidelberg 2008 Helium-Atom-Streuung.Magnetron d

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Modeling of the Magnetron Discharge,sibility of optimizing the deposition parameters without actually performing any real world experiment is attractive..The ideal magnetron sputter deposition simulation would use as input the desired coating characteristics (e.g., electrical resistance, adhesion, refractive index, etc.) and process r

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Transport of Sputtered Particles Through the Gas Phase,mulate the transport of the sputtered particles, and to verify the simulation code by the experimental much more accessible deposition profile [6]..An overview of the simulation of the transport of the sputtered particles through the gas phase is given in this article..Section 6.2 describes the plac

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Process Diagnostics,e being closely related, the relatively new technique of high-power pulsed ionised magnetron sputtering (HPPMS or HIPIMS, see, e.g. [5, 6]) with extremely short voltage pulses compared to pulse repetition time, is not covered in much detail here. The chapter is subdivided into different plasma diagn

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Reactively Sputter-Deposited Solid Electrolytes and Their Applications,puttering..In this paper, we first review the basic crystallographic properties of the most common electrolytes and mixed conductor materials available for energy and environment applications. Section 11.2 is ascribed to the description of different applications where ionic or mixed conductor coatin

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Reactive SputteredWide-Bandgap p-Type Semiconducting Spinel AB2O4 and Delafossite ABO2 Thin Films fing technique, has been presented and the origin of p-type conductivity of these materials has been discussed with considerable attention. Most of the results presented in these sections are reported by various authors working on this field. In Sect. 12.6, synthesis and electro-optical characterizat