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Titlebook: Nanoscale Redox Reaction at Metal/Oxide Interface; A Case Study on Scho Takahiro Nagata Book 2020 National Institute for Materials Science,

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General Introduction,ance limits of conventional materials such as SiO. gate, polycrystalline Si gate, and Al wiring, it is necessary to develop a new material with a new functionality that is not found in Si devices up to now, such as nonvolatile memory function.
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Book 2020e of unique properties, due to their composition, design and/or doping techniques.  .The author introduces a means of selecting oxide materials according to their functions and explains metal/oxide interface physics. As he demonstrates, material development is the key to matching oxide materials to
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Combinatorial Thin-Film Synthesis for New Nanoelectronics Materials,pread thin-film sample can be obtained. In particular, in this chapter, combinatorial focused Ar ion-beam sputtering (FIBS), which is optimized for material research on new metal thin films and developed in NIMS, is mainly introduced.
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Takahiro Nagatae aspects of argumentation (connection between perception /live experiences, knowledge).• What are facts- and do they change with time .• Psychological aspects: rapture of trust; the need for certainty; connection between danger, fear and risk.978-1-4899-9301-4978-1-4419-7868-4
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Takahiro Nagatae aspects of argumentation (connection between perception /live experiences, knowledge).• What are facts- and do they change with time .• Psychological aspects: rapture of trust; the need for certainty; connection between danger, fear and risk.978-1-4899-9301-4978-1-4419-7868-4
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