Titlebook: Ion Implantation Techniques; Lectures given at th Heiner Ryssel,Hans Glawischnig Conference proceedings 1982 Springer-Verlag Berlin Heidelb

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Ion Implantation Equipment from Veecoe major goals were to serve the requirements of both development and production, using the same basic system with modified end stations, with a high-quality standard to make the systems reliable tools with a minimum in downtime. In the following paragraphs, we present a summarized description of our developments.

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The Series IIIA and IIIX Ion ImplantersThe demand for high-current ion implanters in the semiconductor industry has increased substantially over the last 3–4 years and the requirement has divided into two categories:

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978-3-642-68781-5Springer-Verlag Berlin Heidelberg 1982

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The Calculation of Ion Ranges in Solids with Analytic Solutions of prescribing differential scattering cross sections. It turned out that this can be accomplished by connecting directional angular spread to the nuclear energy loss directly, and that this approach yields good agreement with other existing theories and experimental results on projected ranges. Th