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Titlebook: Gallium Oxide; Materials Properties Masataka Higashiwaki,Shizuo Fujita Book 2020 Springer Nature Switzerland AG 2020 Ga2O3.transparent cond

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Mist Chemical Vapor Deposition 1nd is featured by its large bandgap (~5.3 eV), bandgap engineering (3.7 to ~9 eV), and existing corundum-structured .-type oxide such as α-Ir.O., as well as low epitaxy cost on inexpensive sapphire substrates.
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Veronika Lévesque,Cornelia VonhofThis introductory chapter provides current and comprehensive information about gallium oxide, covering crystal structures, basic physical properties, bulk melt growth and thin-film epitaxial growth methods, and representative electrical and optical devices.
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Introduction,This introductory chapter provides current and comprehensive information about gallium oxide, covering crystal structures, basic physical properties, bulk melt growth and thin-film epitaxial growth methods, and representative electrical and optical devices.
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Roman Sauter,Werner Sauter,Roland Wolfig of high structural quality at low production costs per volume unit. A possibility of obtaining bulk β-Ga.O. single crystals by the Czochralski method expands the diversity of growth technologies for this compound towards large volumes and high quality suitable for epitaxial growth of layers and dev
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Concluding Thoughts and Implicationsed by the measurement of the melting temperature of β-Ga.O. and the VB growth processes of β-Ga.O. in ambient air. The characteristic features of the crystallinity and the tentative electric characteristics of β-Ga.O. crystals grown by the VB technique will also be introduced.
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David Parsons,Kathryn MacCallum. The floating zone method section briefly mentions the method’s history and typical growth conditions. The section on edge-defined film-fed growth method discusses the history, growth sequence, and conditions. It also covers the material properties of edge-defined film-fed grown β-Ga.O. such as twi
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