Titlebook: Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams; Efim Oks,Ian Brown Book 2002 Kluwer Academic Publishers 2002

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1568-2609 arc science, and in general foster development of the field. The Workshop was a great success, as was clearly felt by all of the attendees. The small number of978-1-4020-1066-8978-94-010-0277-6Series ISSN 1568-2609

spondylosis

FLAX

High Current Electron Sources and Accelerators with Plasma Emitters,mission current from amperes to kiloamperes as well as beam current densities up to 100 A/cm2, accelerating voltage from several keV to hundred keV and pulse length from 0.1 μs to 100 μs, repetition rate up to hundred kHz.

潜移默化

诱导

Palpable

减震

Implantation of Steel from MEVVA Ion Source with Bronze Cathode,e samples were analyzed by RBS technique using 1.4 MeV He ions. The results show that the retained vs. implanted dose dependence saturates at implanted doses of the order of 1017 cm−2, due to the sputtering effects. The maximum retained doses obtained for Cu and Sn amount to 5.4×1016cm−2 and 1.2 ×1015cm−2, respectively.

战胜

galley

SMART

Physical Basis of Plasma Parameters Control in a Vacuum Arc, measurements of plasma parameters at moderate arc currents. The models discussed and developed, are used to interpret experimental data on the vacuum arc plasma. Interpretation of a few effects observed is given and prediction of arc plasma behaviour is made.