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Titlebook: CMOS VLSI Engineering; Silicon-on-Insulator James B. Kuo,Ker-Wei Su Book 1998 Springer Science+Business Media Dordrecht 1998 CMOS.VLSI.anal

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书目名称CMOS VLSI Engineering
副标题Silicon-on-Insulator
编辑James B. Kuo,Ker-Wei Su
视频videohttp://file.papertrans.cn/221/220369/220369.mp4
图书封面Titlebook: CMOS VLSI Engineering; Silicon-on-Insulator James B. Kuo,Ker-Wei Su Book 1998 Springer Science+Business Media Dordrecht 1998 CMOS.VLSI.anal
描述Silicon-On-Insulator (SOI) CMOS technology has been regarded asanother major technology for VLSI in addition to bulk CMOS technology.Owing to the buried oxide structure, SOI technology offers superiorCMOS devices with higher speed, high density, and reduced second ordereffects for deep-submicron low-voltage, low-power VLSI circuitsapplications. In addition to VLSI applications, and because of itsoutstanding properties, SOI technology has been used to realizecommunication circuits, microwave devices, BICMOS devices, and evenfiber optics applications. ..CMOS VLSI Engineering: Silicon-On-Insulator. addresses three keyfactors in engineering SOI CMOS VLSI - processing technology,device modelling, and circuit designs are all covered with theirmutual interactions. Starting from the SOI CMOS processing technologyand the SOI CMOS digital and analog circuits, behaviors of the SOICMOS devices are presented, followed by a CAD program, ST-SPICE, whichincorporates models for deep-submicron fully-depleted mesa-isolatedSOI CMOS devices and special purpose SOI devices including polysiliconTFTs. ..CMOS VLSI Engineering: Silicon-On-Insulator. is written forundergraduate senior students and first-year
出版日期Book 1998
关键词CMOS; VLSI; analog; circuit; communication; electrical engineering; electronics; integrated circuit; microel
版次1
doihttps://doi.org/10.1007/978-1-4757-2823-1
isbn_softcover978-1-4419-5057-4
isbn_ebook978-1-4757-2823-1
copyrightSpringer Science+Business Media Dordrecht 1998
The information of publication is updating

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H. V. Grushevskaya,G. G. Krylovo bulk CMOS devices, SOI CMOS devices have been reknown for their superior performance in smaller second order effects, no latchup, and higher speed. Due to their unique structure, SOI CMOS devices have performance quite different from the bulk ones. In this chapter, fundamental behaviors of SOI CMO
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Sofiane El-Kirat-Chatel,Audrey Beaussarthe buried oxide isolation structure, accumulation-mode devices are also important. In this chapter, first, the DC and the capacitance models for the accumulation-mode SOI MOS devices are presented. Recently, the trends on the fully-depleted SOI CMOS devices are toward using very thin silicon thin-fi
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