找回密码
 To register

QQ登录

只需一步,快速开始

扫一扫,访问微社区

Titlebook: Beyond Si-Based CMOS Devices; Materials to Archite Sangeeta Singh,Shashi Kant Sharma,Durgesh Nandan Book 2024 The Editor(s) (if applicable)

[复制链接]
查看: 25268|回复: 52
发表于 2025-3-21 19:37:59 | 显示全部楼层 |阅读模式
期刊全称Beyond Si-Based CMOS Devices
期刊简称Materials to Archite
影响因子2023Sangeeta Singh,Shashi Kant Sharma,Durgesh Nandan
视频video
发行地址Presents simulation codes that can be used for the readers’ applications.Supports with pedagogical features such as examples.Demonstrates clear guidelines for device designing
学科分类Springer Tracts in Electrical and Electronics Engineering
图书封面Titlebook: Beyond Si-Based CMOS Devices; Materials to Archite Sangeeta Singh,Shashi Kant Sharma,Durgesh Nandan Book 2024 The Editor(s) (if applicable)
影响因子.This book focuses on summarizing recent research trends for new beyond-CMOS and beyond-silicon devices, circuits, and architectures for computing. It reports the recent achievements in this field from leading research trends around the globe, specifically focusing on nanoscale beyond silicon materials and devices, functional nanomaterials, nanoscale devices, beyond-CMOS devices materials, and their opportunities and challenges. The book is devoted to the fast-evolving field of modern material science and nanoelectronics, particularly to the physics and technology of functional nanomaterials and devices..
Pindex Book 2024
The information of publication is updating

书目名称Beyond Si-Based CMOS Devices影响因子(影响力)




书目名称Beyond Si-Based CMOS Devices影响因子(影响力)学科排名




书目名称Beyond Si-Based CMOS Devices网络公开度




书目名称Beyond Si-Based CMOS Devices网络公开度学科排名




书目名称Beyond Si-Based CMOS Devices被引频次




书目名称Beyond Si-Based CMOS Devices被引频次学科排名




书目名称Beyond Si-Based CMOS Devices年度引用




书目名称Beyond Si-Based CMOS Devices年度引用学科排名




书目名称Beyond Si-Based CMOS Devices读者反馈




书目名称Beyond Si-Based CMOS Devices读者反馈学科排名




单选投票, 共有 0 人参与投票
 

0票 0%

Perfect with Aesthetics

 

0票 0%

Better Implies Difficulty

 

0票 0%

Good and Satisfactory

 

0票 0%

Adverse Performance

 

0票 0%

Disdainful Garbage

您所在的用户组没有投票权限
发表于 2025-3-21 22:09:28 | 显示全部楼层
M. Witko,R. Tokarz-Sobieraj,R. Grybośese applications have been made possible by scaling thanks to improvements in complexity and performance. In order to increase the historical cadence of integrated circuit scaling as dimensional scaling of CMOS inevitably approaches fundamental constraints, a number of pioneering and advancement of
发表于 2025-3-22 01:15:20 | 显示全部楼层
发表于 2025-3-22 08:35:09 | 显示全部楼层
发表于 2025-3-22 10:17:06 | 显示全部楼层
David A. Case,Louis Noodleman,Jian Lianical properties is grabbing worldwide market in the area of electronics, home appliances and medical field. The present book chapter emphasizes on graphene-based field effect transistor devices towards different applications. It comprehensively reviewed the synthesis of graphene, properties of gra
发表于 2025-3-22 14:28:29 | 显示全部楼层
Metal-Ligand Interactions in Cu-Proteins,ces and energy production. The number of devices that focus on non-graphene monolayers has significantly increased due to the novel characteristics and applications arising from two-dimensional confinement. An attempt has been made here to comprehensively describe the present state of the technology
发表于 2025-3-22 19:36:38 | 显示全部楼层
发表于 2025-3-23 00:41:28 | 显示全部楼层
Concepts in Heterogeneous Catalysis,s, and short-channel effects are responsible toward the degradation of the MOS devices. At this point of time, a device which exhibits low leakage and low subthreshold swing is much needed, and tunnel field-effect transistors (TFETs) reported to be a suitable alternative to MOSFETs. TFETs basically
发表于 2025-3-23 02:22:42 | 显示全部楼层
https://doi.org/10.1007/978-94-011-2822-3ve capacitance (NC) into their design. Negative capacitance field-effect transistor (NCFET) is quickly becoming a popular alternative technology that promises to increase the power efficiency of transistors by many times while still being compatible with the current CMOS fabrication method. The tran
发表于 2025-3-23 06:53:35 | 显示全部楼层
 关于派博传思  派博传思旗下网站  友情链接
派博传思介绍 公司地理位置 论文服务流程 影响因子官网 SITEMAP 大讲堂 北京大学 Oxford Uni. Harvard Uni.
发展历史沿革 期刊点评 投稿经验总结 SCIENCEGARD IMPACTFACTOR 派博系数 清华大学 Yale Uni. Stanford Uni.
|Archiver|手机版|小黑屋| 派博传思国际 ( 京公网安备110108008328) GMT+8, 2025-6-10 12:50
Copyright © 2001-2015 派博传思   京公网安备110108008328 版权所有 All rights reserved
快速回复 返回顶部 返回列表