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Titlebook: Advances in Thin Films, Nanostructured Materials, and Coatings; Selected Papers from Alexander D. Pogrebnjak,Valentine Novosad Conference p

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Method for Identification of Optical Resonances of Metal Films,per films deposited on glass substrates at a temperature of 300 °C with an electrical resistivity R < 0.5 Ω/square did not have pronounced Raman peaks, their Raman spectrum and color did not change under 300 mW excitation light with a wavelength λ of 785 nm.
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Lecture Notes in Computer Scienceo 27 GPa due to the formation of α-BCN phase according to Fourier spectra. Nanolayered coatings have been thermally stable up to 600 °C due to the slow diffusion processes in amorphous sublayer, which indicates higher oxidation resistance then nanocrystalline.
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Lecture Notes in Computer Scienceto both more developed surface and higher intrinsic catalytic activity. The value of the exchange current of hydrogen evolution reaction on the multilayer coating is comparable to the value of the exchange current on the Ni–Cu–Mo ternary alloy and nickel-containing electrodes with the highly developed 3D nanostructured surface.
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,Microstructure and Mechanical Properties of Multilayered α-AlN/α-BCN Coatings Depending on Flux Deno 27 GPa due to the formation of α-BCN phase according to Fourier spectra. Nanolayered coatings have been thermally stable up to 600 °C due to the slow diffusion processes in amorphous sublayer, which indicates higher oxidation resistance then nanocrystalline.
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Conference proceedings 2019ermetallic compounds; ultra-hard, wear- and oxidation-resistant and multifunctional coatings; superconducting, magnetic, semiconducting, and dielectric films; electrochemical and electroless depositions; thin-film characterization and instrumentation; and industrial applications..
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Thin Film Deposition by Plasma Beam of a Vacuum Arc with Refractory Anodes, refractory anode vacuum arc (HRAVA) and (ii) with a closed gap—the vacuum arc with black body assembly (VABBA). In both configurations, the anode was heated by the arc with current I = 145–340 A, and a relatively dense plasma plume of cathode material (Cu, Ti, Cr, Al, Sn, Mo, Nb), was formed by re-
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Structure and Properties of Combined Multilayer Coatings Based on Alternative Triple Nitride and Bi. (TiMo)N/TiMo, (CrMo)N/CrMo, (CrZr)N/CrZr, (TiCr)N/TiCr and (MoZr)N/MoZr multilayer coatings were fabricated under the same deposition conditions, while bias potential was −200 V. Total thickness of the coatings was around 54 μm, while bilayer thickness was around 900 nm and we had 60 bilayers in e
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