Titlebook: Advances in Thin Films, Nanostructured Materials, and Coatings; Selected Papers from Alexander D. Pogrebnjak,Valentine Novosad Conference p

ASSET

,The Role of a Thin Aluminum Film in the Reconstruction of Silicon’s Near-Surface Layers,e centers of dislocation-related electroluminescence of structures based on p-Si. Additional elastic deformation (for several hours) of silicon leads to an increase in their concentration. This can be used to increase the efficiency of the luminescence of silicon monocrystals in the infrared region.

圣歌

单色

新陈代谢

悬崖

https://doi.org/10.1007/978-1-4612-0849-5tribution of particles of structural phases and the absence of extended dislocation clusters—zones of crack incipience and propagation. Such substructure of welding joints of high-strength structural steel produced by laser-arc welding provides the high complex of strength properties and crack resistance.

大骂

Introduction to Concurrent Zero-Knowledge,per films deposited on glass substrates at a temperature of 300 °C with an electrical resistivity R < 0.5 Ω/square did not have pronounced Raman peaks, their Raman spectrum and color did not change under 300 mW excitation light with a wavelength λ of 785 nm.

FLIP

Thin Film Deposition by Plasma Beam of a Vacuum Arc with Refractory Anodes,e deposition rate measured in 300 A HRAVAs at distances of 80 mm from the arc axis, to be 3.6; 1.4 and 1.8 μm/min for Cu, Cr and Ti cathodes respectively. Interconnector trenches (100 nm wide ×300 nm deep) on microelectronic wafers were filled using a Cu HRAVA at a rate of 0.5 µm/min.

扫兴

Multilayer Design of CrN/MoN Superhard Protective Coatings and Their Characterisation,n cubic phases of γ-Mo.N and cubic CrN were detected. It was observed that the crystal growth orientation changes while the negative bias voltage of the substrate decreases. The maximum values of hardness (38–42 GPa) among the studied samples were obtained for coatings with a minimal individual layer thickness of 20 nm deposited at U. = −20 V.

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