找回密码
 To register

QQ登录

只需一步,快速开始

扫一扫,访问微社区

Titlebook: Ultra-Fast Silicon Bipolar Technology; Ludwig Treitinger,Mitiko Miura-Mattausch Textbook 1988 Springer-Verlag Berlin Heidelberg 1988 VLSI.

[复制链接]
查看: 35197|回复: 42
发表于 2025-3-21 16:29:42 | 显示全部楼层 |阅读模式
书目名称Ultra-Fast Silicon Bipolar Technology
编辑Ludwig Treitinger,Mitiko Miura-Mattausch
视频video
丛书名称Springer Series in Electronics and Photonics
图书封面Titlebook: Ultra-Fast Silicon Bipolar Technology;  Ludwig Treitinger,Mitiko Miura-Mattausch Textbook 1988 Springer-Verlag Berlin Heidelberg 1988 VLSI.
描述Since the first bipolar transistor was investigated in 1947, enormous efforts have been devoted to semiconductor devices. The strong world­ wide competition in fabricating metal-oxide-semiconductor field-effect of develop­ transistor (MOSFET) memories has accelerated the pace ments in semiconductor technology. Bipolar transistors play a major role due to their high-speed performance. Delay times of about 20 ps per gate have already been achieved. Because of this rapid technologi­ cal progress, it is difficult to predict the future with any certainty. In 1987 a special session on ultrafast bipolar transistors was held at the European Solid-State Device Research Conference. Its aim was to sum­ marize the most recent developments and to discuss the future of bip­ olar transistors. This book is based on that session but also includes contributions by other participants, such that a broad range of up-to­ is presented. Several conclusions can be drawn from date information this information: the first and most important is the very large poten­ tial for future progress still existing in this field. This progress is char­ acterized by the drive towards higher speed and lower power con­ sum
出版日期Textbook 1988
关键词VLSI; circuit; epitaxy; integrated circuit; silicon; simulation; transistor
版次1
doihttps://doi.org/10.1007/978-3-642-74360-3
isbn_softcover978-3-642-74362-7
isbn_ebook978-3-642-74360-3Series ISSN 0172-5734
issn_series 0172-5734
copyrightSpringer-Verlag Berlin Heidelberg 1988
The information of publication is updating

书目名称Ultra-Fast Silicon Bipolar Technology影响因子(影响力)




书目名称Ultra-Fast Silicon Bipolar Technology影响因子(影响力)学科排名




书目名称Ultra-Fast Silicon Bipolar Technology网络公开度




书目名称Ultra-Fast Silicon Bipolar Technology网络公开度学科排名




书目名称Ultra-Fast Silicon Bipolar Technology被引频次




书目名称Ultra-Fast Silicon Bipolar Technology被引频次学科排名




书目名称Ultra-Fast Silicon Bipolar Technology年度引用




书目名称Ultra-Fast Silicon Bipolar Technology年度引用学科排名




书目名称Ultra-Fast Silicon Bipolar Technology读者反馈




书目名称Ultra-Fast Silicon Bipolar Technology读者反馈学科排名




单选投票, 共有 0 人参与投票
 

0票 0%

Perfect with Aesthetics

 

0票 0%

Better Implies Difficulty

 

0票 0%

Good and Satisfactory

 

0票 0%

Adverse Performance

 

0票 0%

Disdainful Garbage

您所在的用户组没有投票权限
发表于 2025-3-21 21:40:27 | 显示全部楼层
发表于 2025-3-22 01:04:36 | 显示全部楼层
978-3-642-74362-7Springer-Verlag Berlin Heidelberg 1988
发表于 2025-3-22 08:05:53 | 显示全部楼层
Ultra-Fast Silicon Bipolar Technology978-3-642-74360-3Series ISSN 0172-5734
发表于 2025-3-22 09:23:01 | 显示全部楼层
History, Present Trends, and Scaling of Silicon Bipolar Technology, Physics for their epochal invention. Since then, bipolar transistors have been widely used for many purposes. Applications can be divided into two broad categories: amplification and switching. As an amplifier more than a factor of 100 in amplification is available and a switching speed in the sub-ns range can be obtained.
发表于 2025-3-22 15:04:08 | 显示全部楼层
Vertical Scaling Considerations for Polysilicon-Emitter Bipolar Transistors,e of polycrystalline silicon (poly-Si) as diffusion source and contact material for the emitter. Besides facilitating the second important achievement, self-alignment between emitter and base contact, the poly-Si emitter has the following major advantages:
发表于 2025-3-22 19:43:16 | 显示全部楼层
Advanced Self-Alignment Technologies and Resulting Structures of High-Speed Bipolar transistors, high-speed circuits are constructed and their excellent performance is nearly equal to that of GaAs devices. Other high-speed transistor structures are demonstrated, and sub- 50ps ECL circuits are predicted.
发表于 2025-3-23 00:23:06 | 显示全部楼层
发表于 2025-3-23 04:37:07 | 显示全部楼层
发表于 2025-3-23 07:26:52 | 显示全部楼层
Self-Aligning Technology for Sub-100nm Deep Base Junction Transistors,a self-aligned bipolar transistor. The new technology, BSA (BSG Self-Aligned) technology, features the use of BSG film as a sidewall spacer between the emitter and base electrodes as well as the diffusion source for the intrinsic base and also for the p.-link region between the intrinsic and extrins
 关于派博传思  派博传思旗下网站  友情链接
派博传思介绍 公司地理位置 论文服务流程 影响因子官网 SITEMAP 大讲堂 北京大学 Oxford Uni. Harvard Uni.
发展历史沿革 期刊点评 投稿经验总结 SCIENCEGARD IMPACTFACTOR 派博系数 清华大学 Yale Uni. Stanford Uni.
|Archiver|手机版|小黑屋| 派博传思国际 ( 京公网安备110108008328) GMT+8, 2025-6-18 13:23
Copyright © 2001-2015 派博传思   京公网安备110108008328 版权所有 All rights reserved
快速回复 返回顶部 返回列表