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Titlebook: Rare Earth Oxide Thin Films; Growth, Characteriza Marco Fanciulli,Giovanna Scarel Book 2007 Springer-Verlag Berlin Heidelberg 2007 Depositi

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楼主: emanate
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Strain-Relief at Internal Dielectric Interfaces in High-, Gate Stacks with Transition Metal and Rarare earth atom elemental and complex oxides, as well as transition metal silicate alloys. The focus is on the strain-induced defects, and the reduction of defect densities through strain-driven self-organizations that take place during high-temperature post-deposition annealing.
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