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Titlebook: Optical Properties of Low Dimensional Silicon Structures; Daniel C. Bensahel,Leigh T. Canham,Stephano Ossici Book 1993 Kluwer Academic Pub

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书目名称Optical Properties of Low Dimensional Silicon Structures
编辑Daniel C. Bensahel,Leigh T. Canham,Stephano Ossici
视频video
丛书名称NATO Science Series E:
图书封面Titlebook: Optical Properties of Low Dimensional Silicon Structures; Daniel C. Bensahel,Leigh T. Canham,Stephano Ossici Book 1993 Kluwer Academic Pub
描述The workshop on "Optical Properties of Low Dimensional Silicon sL Structures" was held in Meylan, France on March, I yd, 1993. The workshop took place inside the facilities of France Telecom- CNET. Around 45 leading scientists working on this rapidly moving field were in attendance. Principal support was provided by the Advanced Research Workshop Program of the North Atlantic Treaty Organisation (NATO). French Delegation a l‘Armement and CNET gave also a small financial grant, the organisational part being undertaken by the SEE and CNET. There is currently intense research activity worldwide devoted to the optical properties of low dimensional silicon structures. This follow the recent discovery of efficient visible photoluminescence (PL) from highly porous silicon. This workshop was intended to bring together all the leading European scientists and laboratories in order to reveal the state of the art and to open new research fields on this subject. A large number of invited talks took place (12) together with regular contribution (20). The speakers were asked to leave nearly 1/3 of the time to the discussion with the audience, and that promoted both formal and informal discussions
出版日期Book 1993
关键词Exciton; Magnetic Resonance; crystal; liquid; microscopy; modeling
版次1
doihttps://doi.org/10.1007/978-94-011-2092-0
isbn_softcover978-94-010-4927-6
isbn_ebook978-94-011-2092-0Series ISSN 0168-132X
issn_series 0168-132X
copyrightKluwer Academic Publishers 1993
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Microporous Silicon: Formation Mechanism and Preparation Method,the porous region due to quantum confinement, is discussed. The second section is dedicated to the methods of sample preparation and the influence of preparational parameters on the morphology of the porous layer.
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Fabrication of Si Nanostructures for Light Emission Study,ll behaved and ordered Si nanostrctures are desirable for facilitating the characterization process and the interpretation of experimental results. A combination of high resolution electron beam lithography, anisotropic reactive ion etching (RIE), and thermal oxidation was shown to yield such well b
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