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Titlebook: Optical Interference Coatings; Norbert Kaiser,Hans K. Pulker Book 2003 Springer-Verlag Berlin Heidelberg 2003 Dielectric thin films.Interf

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Natural Coatings,forms (Parker 1998, 1999). Light is believed to drive significant selection pressures that have been responsible for the subsequent development of all life; creating the astonishing diversity of photonic systems that are present in the world today.
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Photonic Structures as Interference Devices,ics and solid state physics. It is therefore a challenge to write this chapter as an attempt to bridge the gap between two communities that would obviously benefit from lively communication. We shall start with a brief historical introduction.
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Characterisation and Monitoring,h to lower limits in the UV/VUV- and even the EUV-spectral range and defines new specifications in respect to life time and contamination of optical coatings. Not least, complex spectral transfer functions have to be fulfilled by optical coatings in the emerging fields of telecommunication and applications of modern optics in precision metrology.
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Laser Resistant Coatings,ne of the four primary research topics. This symposium has been the premier repository of documented research in laser resistant optical thin films. Although the subject of laser damage in optical materials is a rather narrow field of research, there are some excellent books on the subject (Kozlowski 1995; Wood 1986).
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0342-4111 This book is designed to give a concise but complete overview of the field, with contributions written by leading experts in the various areas. Topics include design, materials, film growth, deposition including large area, characterization and monitoring, and mechanical stress. The authors also des
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Optical Coatings for the DUV / VUV,costs optical lithography using excimer laser based reduction wafer steppers is one of the key technologies for generation of the smallest lateral dimensions down to 0.1 µm and below (Rothschild and Ehrlich 1988, Rothschild et al. 1997, Rothschild 1998).
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Multilayer Coatings for EUV/Soft X-ray Mirrors,microscopy in the “water window” (λ = 2.3 – 4.4 nm), astronomy (λ = 5 – 31 nm), spectroscopy, plasma diagnostics and EUV/Soft X-ray laser research have led to considerable progress in the development of different sources and optics for this spectral range.
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