Titlebook: Major Companies of Europe 1990/91 Volume 3; Major Companies of W R M Whiteside,A Wilson,C P Wilson Book 1990 Graham & Trotman Limited 1990

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R M Whiteside,A Wilson,S Blackburn,S E Hörnig,C P Wilsonr dimensions. This fluctuation in device geometries might prevent them from meeting timing and power criteria and degrade the parametric yield. Process limitations are not exhibited as physical disparities only; transistors experience temporal device degradation as well. On top of it, power manageme

Mortar

R M Whiteside,A Wilson,S Blackburn,S E Hörnig,C P Wilsonent aggressive voltage scaling to reduce energy. Post-fabrication configuration, as we have in FPGAs, provides an opportunity to avoid the high costs of static margins. Rather than assuming worst-case device characteristics, we can deploy devices based on their fabricated or aged characteristics. Th

易弯曲

R M Whiteside,A Wilson,S Blackburn,S E Hörnig,C P Wilsonent aggressive voltage scaling to reduce energy. Post-fabrication configuration, as we have in FPGAs, provides an opportunity to avoid the high costs of static margins. Rather than assuming worst-case device characteristics, we can deploy devices based on their fabricated or aged characteristics. Th

NAV

镶嵌细工

pulmonary

ARM

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978-94-010-6847-5Graham & Trotman Limited 1990

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Scintillations