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Titlebook: High Permittivity Gate Dielectric Materials; Samares Kar Book 2013 Springer-Verlag Berlin Heidelberg 2013 Advanced gate stacks.Dielectric

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ply; see, for example, Burt, Koo and Dudley (1980) or Taylor and Talpaz (1979). It has been argued that overall welfare benefits can result from price stabilisation (Turnovsky (1978)). Klein (1978) has argued that optimal control methods might provide some promising methodological approaches to the problem of buffer stock management.
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Akira Toriumi,Toshihide Nabatameis chapter discusses the details of the analysis, design, and implementation of an agent-based hybrid intelligent system (called . for complex problem solving and decision making according to the available agent-oriented software engineering methodologies. The applications of the society in financial investment planning are also addressed.
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Reliability Implications of Fast and Slow Degradation Processes in High-k Gate Stacks,dation. In this chapter, we focus on the reliability implications of instabilities associated with pre-existing structural defects in both the high-k film and the interfacial layer of gate oxide stacks subjected to a variety of reliability tests.
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Introduction to High-k Gate Stacks,s and cohesive as possible; (2) more importantly, to provide the basics, the definitions, simple explanations, and the missing links; (3) and to acclimatize the uninitiated reader. This chapter begins with an historical account going back some four decades when research was initiated into the Metal
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MOSFET: Basics, Characteristics, and Characterization,ansistor (MOSFET/MISFET), their characteristics, and their characterization (parameter extraction); the theoretical treatment starts from the first principles. While deriving the mathematical relations, assumptions have been avoided as far as possible. A comprehensive treatment is included which cov
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