书目名称 | High Permittivity Gate Dielectric Materials | 编辑 | Samares Kar | 视频video | | 概述 | Most advanced and comprehensive book on high permittivity gate dielectrics.Covers the basics, latest developments, and applications.A reference work for researchers, electrical engineers and materials | 丛书名称 | Springer Series in Advanced Microelectronics | 图书封面 |  | 描述 | ."The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects."... | 出版日期 | Book 2013 | 关键词 | Advanced gate stacks; Dielectric materials; Gate dielectrics; High permittivity; Nano MOSFETs | 版次 | 1 | doi | https://doi.org/10.1007/978-3-642-36535-5 | isbn_softcover | 978-3-662-50138-2 | isbn_ebook | 978-3-642-36535-5Series ISSN 1437-0387 Series E-ISSN 2197-6643 | issn_series | 1437-0387 | copyright | Springer-Verlag Berlin Heidelberg 2013 |
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