找回密码
 To register

QQ登录

只需一步,快速开始

扫一扫,访问微社区

Titlebook: Heavily Doped Semiconductors; Victor I. Fistul’ Book 1969 Springer Science+Business Media New York 1969 Doping.crystal.electron.growth.pap

[复制链接]
楼主: 监督
发表于 2025-3-25 03:49:11 | 显示全部楼层
Optical Properties of Heavily Doped Semiconductors,esents the ratio of the intensities of the transmitted J and incident J. light, while R on the right-hand side represents the coefficient for a single reflection from the surface of a sample of thickness d.
发表于 2025-3-25 09:44:06 | 显示全部楼层
Behavior of Impurities in Heavily Doped Semiconductors,large distances so that the interaction between them can be neglected, at least in the first approximation. In the heavy doping case, we must allow for the interaction between the impurities themselves, between the impurities and the host atoms, and between the impurities and the structure defects.
发表于 2025-3-25 12:01:08 | 显示全部楼层
Preparation of Heavily Doped Semiconductors,ion process; they are affected also by the growth conditions. The latter may depend strongly on the apparatus used. Moreover, the nature and concentration of the dopant may affect considerably the process of growth and the properties of an ingot. The latter two factors are particularly important in
发表于 2025-3-25 19:05:49 | 显示全部楼层
Some Applications of Heavily Doped Semiconductors, cm−3. The free-carrier density in such materials has been of the same order or even less. The relative positions of the Fermi level and of the band edges in such semiconductors are shown in Fig. 7.1. The energy structure of p—n junctions (under thermodynamic equilibrium conditions) formed in such c
发表于 2025-3-25 23:48:24 | 显示全部楼层
range of applications of such. materials. Moreover, the heavy doping of semiconductors produces new effects (the forma­ tion of impurity aggregates, the appearance of allowed states in the forbidden band, etc J, which are of great interest in solid-state physics. The rapid growth in the number of p
发表于 2025-3-26 02:10:33 | 显示全部楼层
发表于 2025-3-26 05:39:35 | 显示全部楼层
发表于 2025-3-26 10:27:20 | 显示全部楼层
发表于 2025-3-26 14:58:59 | 显示全部楼层
发表于 2025-3-26 19:05:47 | 显示全部楼层
 关于派博传思  派博传思旗下网站  友情链接
派博传思介绍 公司地理位置 论文服务流程 影响因子官网 SITEMAP 大讲堂 北京大学 Oxford Uni. Harvard Uni.
发展历史沿革 期刊点评 投稿经验总结 SCIENCEGARD IMPACTFACTOR 派博系数 清华大学 Yale Uni. Stanford Uni.
|Archiver|手机版|小黑屋| 派博传思国际 ( 京公网安备110108008328) GMT+8, 2025-5-19 02:22
Copyright © 2001-2015 派博传思   京公网安备110108008328 版权所有 All rights reserved
快速回复 返回顶部 返回列表