Titlebook: Gaseous and Electrochemical Hydrogen Storage Properties of Mg-Based Thin Films; Gongbiao Xin Book 2016 Springer-Verlag Berlin Heidelberg 2

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https://doi.org/10.1007/978-94-6300-863-1roperties. According to the reported studies, the main approach to improve the properties of thick Mg–Pd films is preparing Mg alloy films by magnetron co-sputtering. The alloying elements are commonly transition metals or rare earth elements. Due to the large weight of transition metals and rare ea

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Nietzsche: Out of the Spirit of Music,e properties under mild conditions. We studied the effects of Ti, Al interlayers, the morphologies, and the transition metal addition on the hydrogen storage properties under mild conditions by inserting different Ti, Al interlayers, fabricating films with different morphologies and preparing Mg–Ti

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Book 2016tical investigation of their gaseous and electrochemical hydrogen storage properties under mild conditions. It reviews promising applications of Mg-based thin films in smart windows, hydrogen sensors and Ni-MH batteries, while also providing significant insights into research conducted on Mg-based h

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Structural Tailoring of Mg-Based Thin Films and Study of Their Hydrogen Storage Properties,ders. Previous research has demonstrated that the hydrogen storage properties of Mg-based materials are greatly affected by special morphologies, due to the alterations of specific surface areas, grain sizes, and reactive sites.

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Book 2016ydrogen storage materials, especially the Mg-based films. Moreover, the unique experimental procedures and methods (including electric resistance, optical transmittance and electrochemical methods) used in this thesis will serve as a valuable reference for researchers in the field of Mg-based hydrogen storage films.. .

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Art and Politics under Modern Dictatorshipsively. The magnetron discharges were generated under an argon pressure of 0.6 Pa with the argon flow rate of 76 sccm. The purity of argon pressure is 99.99 %. The overall purity of Mg, Ti, Al, and Pd is 99.99 %. After Mg film deposition, 10 nm Pd cap layer was deposited on the top, which is necessary to protect.

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Experimental Methods,ively. The magnetron discharges were generated under an argon pressure of 0.6 Pa with the argon flow rate of 76 sccm. The purity of argon pressure is 99.99 %. The overall purity of Mg, Ti, Al, and Pd is 99.99 %. After Mg film deposition, 10 nm Pd cap layer was deposited on the top, which is necessary to protect.