| 书目名称 | Evolution of Thin Film Morphology | | 副标题 | Modeling and Simulat | | 编辑 | Matthew Pelliccione,Toh-Ming Lu | | 视频video | | | 概述 | Presents basic modeling and simulation tools for quantitative description of thin film morphological evolution.Displays clear conceptual developments in the fundamental understanding of complex surfac | | 丛书名称 | Springer Series in Materials Science | | 图书封面 |  | | 描述 | Thin?lmdepositionisthemostubiquitousandcriticaloftheprocessesusedto manufacture high-tech devices such as microprocessors, memories, solar cells, microelectromechanicalsystems(MEMS),lasers,solid-statelighting,andp- tovoltaics. The morphology and microstructure of thin ?lms directly controls their optical, magnetic, and electrical properties, which are often signi?cantly di?erent from bulk material properties. Precise control of morphology and microstructure during thin ?lm growth is paramount to producing the - sired ?lm quality for speci?c applications. To date, many thin ?lm deposition techniques have been employed for manufacturing ?lms, including thermal evaporation,sputterdeposition,chemicalvapordeposition,laserablation,and electrochemical deposition. The growth of ?lms using these techniques often occurs under highly n- equilibrium conditions (sometimes referred to as far-from-equilibrium), which leads to a rough surface morphology and a complex temporal evolution. As atoms are deposited on a surface, atoms do not arrive at the surface at the same time uniformly across the surface. This random ?uctuation, or noise, which is inherent to the deposition process, may create surfa | | 出版日期 | Book 20081st edition | | 关键词 | Helium-Atom-Streuung; REM; aggregation models; coating; continuum equations; modeling; morphology; plasma e | | 版次 | 1 | | doi | https://doi.org/10.1007/978-0-387-75109-2 | | isbn_softcover | 978-1-4419-2580-0 | | isbn_ebook | 978-0-387-75109-2Series ISSN 0933-033X Series E-ISSN 2196-2812 | | issn_series | 0933-033X | | copyright | Springer-Verlag New York 2008 |
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发表于 2025-3-21 16:14:55
