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Titlebook: Erosion and Growth of Solids Stimulated by Atom and Ion Beams; G. Kiriakidis,G. Carter,J. L. Whitton Book 1986 Martinus Nijhoff Publishers

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书目名称Erosion and Growth of Solids Stimulated by Atom and Ion Beams
编辑G. Kiriakidis,G. Carter,J. L. Whitton
视频video
丛书名称NATO Science Series E:
图书封面Titlebook: Erosion and Growth of Solids Stimulated by Atom and Ion Beams;  G. Kiriakidis,G. Carter,J. L. Whitton Book 1986 Martinus Nijhoff Publishers
描述The members of the organising Committee and their colleagues have, for many years been investigating the evol­ ution of the fas‘cinating surface features which develop during sputtering erosion of solids. Such experimental, theoretical and computational studies have also been carried out in many international laboratories and, as well as much cow~onality and agreement, substantial disagreements were unresolved. In view of the increasing importance of such processes in technological applications such as microlitho­ graphic etching for the patterning of solid state devices and in fusion technology it was felt opportune to hold a meeting in this area. Furthermore the use of energetic atomic and ion fluxes is also becoming of increasing importance in assisting or modifying the growth of thin films in a number of important industrial processes and it was therefore rational to combine the, study of both erosional and growth processes in a single meeting. These proceedings include 16 invited review and 15 oral or poster presented contributions to the NATO Advanced Study Institute on the "Erosion and Growth of Solids Stimulated by Atom and Ion Beams". The review contributions span the rang
出版日期Book 1986
关键词ceramics; cluster; diffusion; metals; particles; segregation; semiconductor; semiconductors; thin films
版次1
doihttps://doi.org/10.1007/978-94-009-4422-0
isbn_softcover978-94-010-8468-0
isbn_ebook978-94-009-4422-0Series ISSN 0168-132X
issn_series 0168-132X
copyrightMartinus Nijhoff Publishers, Dordrecht 1986
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The Theory of the Preferential Sputtering of Alloys, Including the Role of Gibbsian Segregation,ed situation in which the outermost atom layer shows a composition spike of one component while a depleted region begins at atom layer .. This situation is manifested in experimental profiles, in conflicting results between experiments done (for example) with Ion Scattering and Auger Electron Spectr
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On the Composition of the Sputtered Flux from Metal Targets and their Compounds,ms. This is no longer true for oxides as well as for targets with adsorbed oxygen on the surface. In addition, excited and ionized particles as well as molecules are sputtered under such conditions and their contribution to the sputtered flux can increase by orders of magnitude (1,2). This effect is
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Geometric Methods of Analysis,ither accretion or erosion, but which have been utilised specifically in connection with the topographical modification of crystalline and amorphous solids subjected to energetic atom bombardment. Both the methods, and where appropriate, the mathematical theory are treated in chronological order, ev
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Surface Topographical Evolution: Computational Methods of Analysis, some geometrical examples of developing surfaces have been described by Nobes.. For many practical applications however, where the characteristics are not straight lines, only computational models allow detailed quantitative calculations to be made. In three dimensions even when the characteristics
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Experimental Studies of Morphology Development,f the approximately eight years of experimental investigation of ion beam-induced modification of metal surfaces made by myself and my many collaborators. A list of these collaborators and the many institutes involved is given in the Acknowledgements section. However, I would like to preface this co
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Investigation of Microtopography Induced during Sputter Depth Profiling of Ni/Cr Multilayered Strucental composition near surfaces. The electron and mass spectrometry in conjunction with ion sputter erosion allow one to probe the in-depth elemental composition near surfaces as well as the interfaces within the solids. In such a way the so called sputter depth profiles are obtained (1,2).
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