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派博传思国际中心 »期刊书目

› Journal of SCIE
› PHYSICS, APPLIED(应用物理学)

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SCIE期刊PLASMA CHEMISTRY AND PLASMA PROCESSING 2024/2025影响因子:2.613 (PLASMA CHEM PLASMA P) (0272-4324). (PHYSICS, APPLIED)

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发表于 2025-3-21 18:41:49 | 显示全部楼层 |阅读模式
期刊全称PLASMA CHEMISTRY AND PLASMA PROCESSING
期刊简称PLASMA CHEM PLASMA P
影响因子20242.613
视频video
ISSN0272-4324
eISSN1572-8986
出版商SPRINGER
发行地址ONE NEW YORK PLAZA, SUITE 4600 , NEW YORK, United States, NY, 10004
学科分类1.Science Citation Index Expanded (SCIE)--Engineering, Chemical | Physics, Applied | Physics, Fluids & Plasmas; 2.Current Contents Electronics & Telecommunications Collection--Chemistry & Physics, Pure & Applied; 3.Current Contents Engineering, Computing & Technology--Chemical Engineering; 4.Current Contents Physical, Chemical & Earth Sciences--Physical Chemistry/Chemical Physics; 5.Essential Science Indicators--Chemistry;
出版语言English
The information of publication is updating

SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(20 21 REV HIST)影响因子


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(PLASMA CHEM PLASMA P)影响因子@(应用物理学)学科排名


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(20 21 REV HIST)总引论文


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(PLASMA CHEM PLASMA P)总引论文@(应用物理学)学科排名


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(20 21 REV HIST)影响因子


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(PLASMA CHEM PLASMA P)总引频次@(应用物理学)学科排名


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(20 21 REV HIST)即时影响因子


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(PLASMA CHEM PLASMA P)即时影响因子@(应用物理学)学科排名


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(20 21 REV HIST)五年累积影响因子


SCIE(SCI)期刊PLASMA CHEMISTRY AND PLASMA PROCESSING(PLASMA CHEM PLASMA P)五年累积影响因子@(应用物理学)学科排名


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发表于 2025-3-22 00:06:37 | 显示全部楼层
Initiative
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发表于 2025-3-22 03:25:49 | 显示全部楼层
Submitted on: 29 October 2003. Revised on: 22 November 2003. Accepted on: 28 November 2003. PLASMA CHEMISTRY AND PLASMA PROCESSING
长矛
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发表于 2025-3-22 06:37:42 | 显示全部楼层
Submitted on: 29 May 2000. Revised on: 11 June 2000. Accepted on: 03 July 2000. PLASMA CHEMISTRY AND PLASMA PROCESSING
憎恶
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发表于 2025-3-22 09:37:12 | 显示全部楼层
Submitted on: 02 November 2015. Revised on: 07 December 2015. Accepted on: 01 January 2016. PLASMA CHEMISTRY AND PLASMA PROCESSING
dainty
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发表于 2025-3-22 15:11:18 | 显示全部楼层
Submitted on: 26 October 2008. Revised on: 17 November 2008. Accepted on: 26 November 2008. PLASMA CHEMISTRY AND PLASMA PROCESSING
补角
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发表于 2025-3-22 18:17:58 | 显示全部楼层
Submitted on: 19 October 2019. Revised on: 02 December 2019. Accepted on: 11 December 2019. PLASMA CHEMISTRY AND PLASMA PROCESSING
GROUP
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发表于 2025-3-22 23:26:42 | 显示全部楼层
Submitted on: 19 August 2000. Revised on: 28 August 2000. Accepted on: 25 September 2000. PLASMA CHEMISTRY AND PLASMA PROCESSING
Patrimony
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发表于 2025-3-23 04:25:32 | 显示全部楼层
Submitted on: 11 June 2013. Revised on: 09 July 2013. Accepted on: 04 August 2013. PLASMA CHEMISTRY AND PLASMA PROCESSING
cauda-equina
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发表于 2025-3-23 06:52:35 | 显示全部楼层
Submitted on: 22 January 2006. Revised on: 06 February 2006. Accepted on: 12 February 2006. PLASMA CHEMISTRY AND PLASMA PROCESSING
PLIC
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