| 书目名称 | Chemical Solution Deposition of Functional Oxide Thin Films | | 编辑 | Theodor Schneller,Rainer Waser,David Payne | | 视频video | | | 概述 | First book which comprises all aspects of CSD of functional oxide thin films.Includes supplementary material: | | 图书封面 |  | | 描述 | .This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the ap | | 出版日期 | Book 2013 | | 关键词 | Chemical Solution Deposition; Functional Oxide Films | | 版次 | 1 | | doi | https://doi.org/10.1007/978-3-211-99311-8 | | isbn_softcover | 978-3-7091-1915-0 | | isbn_ebook | 978-3-211-99311-8 | | copyright | Springer-Verlag Wien 2013 |
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发表于 2025-3-21 16:13:18
