Titlebook: Atomistic Aspects of Epitaxial Growth; Miroslav Kotrla,Nicolas I. Papanicolaou,Luc T. Wil Book 2002 Springer Science+Business Media Dordre

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Realistic Atomistic Modeling of Mound Formation During Multilayer Growth: Metal(100) Homoepitaxyh on Ag(100) in the temperature range 175-300 K corresponding to “mound formation”. The model accounts for irreversible formation of islands in each layer mediated by terrace diffusion, growth coalescence of islands within each layer, a non-uniform step edge barrier inhibiting downward transport, an

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Patterning Surfaces by Self-Organized Growth lateral order, however, remains an experimental challenge. In this contribution we discuss the fabrication of nanostructures via self-organized growth at surfaces. Advantages and limitations of diffusion controlled molecular beam epitaxy are discussed and novel routes for the fabrication of ordered nanostructures are presented.