Titlebook: Alternative Lithography; Unleashing the Poten Clivia M. Sotomayor Torres Book 2003 Springer Science+Business Media New York 2003 electronic

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Application of Nanoimprint Lithography in Magnetism,arge area patterning.. while interference lithography is a simple technique, it is only suitable for the fabrication of regular pattern arrays. Finally, ion irradiation with a stencil mask provides an interesting alternative but still considerable efforts have to be made in order to show a performance of both high resolution and high throughput.

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Book 2003 today ‘s wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about

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Alternative Lithography,sometimes in the atomic scale. Depending on application, there are varying degrees of strong specifications, which have to be met in industrially relevant processes due to manufacturability and costs considerations as, for example, in the electronics industry. However, it appears that less demanding

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Nanoimprint Lithography,han a fundamental physical length scale, conventional theory may no longer apply and new phenomena emerge. To fully benefit from the discovery and innovation in nanostructures and commercialize them, a low-cost and high-throughput manufacturing of nanostructures is essential. One biggest challenge t

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Viscoelastic Properties of Polymers,ts simplicity. This lithog-raphy already apparent in the works of S. Chou, .–. who demonstrated that features of a few ten’s of nanometers can be imprinted with a standard laboratory press. The lithog-raphy of embossing reach back into history and are applied today in the production of numerous prod

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Nanorheology,al. The viscous molding material is shaped by either pressing the hard stamp into it (embossing or imprinting) or by filling of a cavity containing a structured mold insert (casting or injection molding). In order to achieve a reasonable process time and yield, this is usually carried out under pres

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Wafer Scale Nanoimprint Lithography,gy. It got even larger attention when it was reported that sub 10 nm features on a Si stamp could be replicated into a resist layer, which in turn had a profile allowing a lift-off process to be possible..,. More reports about NIL technology followed and soon also devices were reported made with NIL

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Step and Stamp Imprint Lithography, the semiconductor industry has relied on optical lithography and new generations of optical steppers are being developed for shorter wavelengths. Anyhow, in order to produce sub-50 nm lithography researches have started to look for new solutions, such as X-ray lithography, fast electron beam (e-bea

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Step and Flash Imprint Lithography,ools? A combination of improvements in optics, reduction in wavelength, and the introduction of more complex photomasks and processes has enabled printing of features smaller than 100 nm. These improvements came at a cost, however, and this cost has followed an exponentially in-creasing trend (1). T

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Using PDMS as a thermocurable resist for a mold assisted imprint process,, low cost and high throughput is becoming a prime necessity. Nowadays, this demand arises not only from the microelectronics community where miniaturization has been a driving strategy since a long time, but originates from many fields: optics, photonics, nanoelectronics, nano-magnetism, nano-elect