| 书目名称 | Precursor Chemistry of Advanced Materials |
| 副标题 | CVD, ALD and Nanopar |
| 编辑 | Roland A. Fischer |
| 视频video | |
| 概述 | Each volume of Topics in Organometallic Chemistry provides the broad scientific readership with comprehensive summary and critical overview of a topic in organometallic chemistry.Research in this rapi |
| 丛书名称 | Topics in Organometallic Chemistry |
| 图书封面 |  |
| 描述 | .Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.. |
| 出版日期 | Book 2005 |
| 关键词 | Chemical Vapour Deposition; Inorganic Chemistry; Materials Science; Organometallic Chemistry; Precursors |
| 版次 | 1 |
| doi | https://doi.org/10.1007/b75019 |
| isbn_softcover | 978-3-642-05688-8 |
| isbn_ebook | 978-3-540-31451-6Series ISSN 1436-6002 Series E-ISSN 1616-8534 |
| issn_series | 1436-6002 |
| copyright | Springer-Verlag Berlin Heidelberg 2005 |
发表于 2025-3-21 18:22:14
