| 书目名称 | Plasma Processing of Semiconductors |
| 编辑 | P. F. Williams |
| 视频video | http://file.papertrans.cn/750/749139/749139.mp4 |
| 丛书名称 | NATO Science Series E: |
| 图书封面 |  |
| 描述 | .Plasma Processing of Semiconductors. contains 28contributions from 18 experts and covers plasma etching, plasmadeposition, plasma-surface interactions, numerical modelling,plasma diagnostics, less conventional processing applications ofplasmas, and industrial applications. ..Audience:. Coverage ranges from introductory to state of the art,thus the book is suitable for graduate-level students seeking anintroduction to the field as well as established workers wishing tobroaden or update their knowledge. |
| 出版日期 | Book 1997 |
| 关键词 | Plasma; collision; dusty plasma; integrated circuit; optics; photoelektrochemische Zelle; plasma etching; p |
| 版次 | 1 |
| doi | https://doi.org/10.1007/978-94-011-5884-8 |
| isbn_softcover | 978-94-010-6486-6 |
| isbn_ebook | 978-94-011-5884-8Series ISSN 0168-132X |
| issn_series | 0168-132X |
| copyright | Springer Science+Business Media Dordrecht 1997 |
|Archiver|手机版|小黑屋|
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