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Titlebook: Nanofabrication; Principles and Appli Christo Papadopoulos Book 2016 The Author(s) 2016 Emerging Self-assembly Approaches.Metallic Nanopart

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发表于 2025-3-21 19:49:55 | 显示全部楼层 |阅读模式
书目名称Nanofabrication
副标题Principles and Appli
编辑Christo Papadopoulos
视频video
概述Includes supplementary material:
丛书名称SpringerBriefs in Materials
图书封面Titlebook: Nanofabrication; Principles and Appli Christo Papadopoulos Book 2016 The Author(s) 2016 Emerging Self-assembly Approaches.Metallic Nanopart
描述This book provides an overview of the techniques and tools of nanostructure fabrication from state-of-the-art lithography to emerging self-assembly approaches. Top-down and bottom-up methodologies along with hybrid approaches are used to illustrate the fabrication of structures including integrated circuits, semiconductor quantum dots, metallic nanoparticles, carbon nanotubes, molecular structures, nanocomposites, arrays and superstructures. Nanofabrication applications in nanoelectronics, biotechnology, nanomechanical devices and nanophotonics will be examined. This brief will present the core concepts of nanofabrication relevant to researchers and industry in this important and rapidly evolving area.
出版日期Book 2016
关键词Emerging Self-assembly Approaches; Metallic Nanoparticles; Nanofabrication Applications; Nanofabricatio
版次1
doihttps://doi.org/10.1007/978-3-319-31742-7
isbn_softcover978-3-319-31740-3
isbn_ebook978-3-319-31742-7Series ISSN 2192-1091 Series E-ISSN 2192-1105
issn_series 2192-1091
copyrightThe Author(s) 2016
The information of publication is updating

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Nanofabrication978-3-319-31742-7Series ISSN 2192-1091 Series E-ISSN 2192-1105
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https://doi.org/10.1007/978-3-319-31742-7Emerging Self-assembly Approaches; Metallic Nanoparticles; Nanofabrication Applications; Nanofabricatio
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2192-1091 e examined. This brief will present the core concepts of nanofabrication relevant to researchers and industry in this important and rapidly evolving area.978-3-319-31740-3978-3-319-31742-7Series ISSN 2192-1091 Series E-ISSN 2192-1105
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Book 2016proaches. Top-down and bottom-up methodologies along with hybrid approaches are used to illustrate the fabrication of structures including integrated circuits, semiconductor quantum dots, metallic nanoparticles, carbon nanotubes, molecular structures, nanocomposites, arrays and superstructures. Nano
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Direct-Write Lithography Approaches,the desired pattern followed by development and subsequent planar processing steps as outlined in Chap. 2. More commonly, such direct-write, or ., approaches employ electron or ion beams in order to achieve higher resolution for nanoscale fabrication as described in the following sections.
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Direct-Growth and Self-assembly,in the following sections. Often the greatest challenge becomes finding the best way to select from a multitude of options in order to harness self-assembly in a way this is suitable for the requirements of nanofabrication.
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