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Titlebook: Microwave Discharges; Fundamentals and App Carlos M. Ferreira,Michel Moisan Book 1993 Springer Science+Business Media New York 1993 Plasma.

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书目名称Microwave Discharges
副标题Fundamentals and App
编辑Carlos M. Ferreira,Michel Moisan
视频video
丛书名称NATO Science Series B:
图书封面Titlebook: Microwave Discharges; Fundamentals and App Carlos M. Ferreira,Michel Moisan Book 1993 Springer Science+Business Media New York 1993 Plasma.
出版日期Book 1993
关键词Plasma; Semiconductor; electron; ion; waves
版次1
doihttps://doi.org/10.1007/978-1-4899-1130-8
isbn_softcover978-1-4899-1132-2
isbn_ebook978-1-4899-1130-8Series ISSN 0258-1221
issn_series 0258-1221
copyrightSpringer Science+Business Media New York 1993
The information of publication is updating

书目名称Microwave Discharges影响因子(影响力)




书目名称Microwave Discharges影响因子(影响力)学科排名




书目名称Microwave Discharges网络公开度




书目名称Microwave Discharges网络公开度学科排名




书目名称Microwave Discharges被引频次




书目名称Microwave Discharges被引频次学科排名




书目名称Microwave Discharges年度引用




书目名称Microwave Discharges年度引用学科排名




书目名称Microwave Discharges读者反馈




书目名称Microwave Discharges读者反馈学科排名




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Modeling of Surface-Wave-Sustained Plasmas in Static Magnetic Fields: A Tool for the Study of Magnetnese factories but there are still open questions concerning pattern profiles, selectivity and rate of processes, uniformity, rate and damage control of the surfaces treated. Clearly, additional research work is required before the long term viability of such machines be definitely proven.
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ECR Plasma Sourcesyclotron resonance (ECR), achieved by superimposing a weak magnetic field to the configuration, led to substantial improvements. The resulting ECR sources offer several advantages, the most important ones being:
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Diagnostics of Microwave Dischargeswide field of plasma physics. To the latter end reviews such as those of Hutchinson., Lochte-Holtgreven., Auciello and Flamm., Griem. and other contributions at this workshop may be referred to. In the last part of this review some specific methods will be commented on in view of current studies and attempts of improvement.
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Optical Diagnostics for High Electron Density PlasmasCyclotron Resonance plasmas. For the plasmas mentioned, the electron density is typical in the range of 10. to 10. m., and the electron velocity distribution is close to a Maxwellian velocity distribution.
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