| 书目名称 | Low Pressure Plasmas and Microstructuring Technology | | 编辑 | Gerhard Franz | | 视频video | | | 概述 | Plasma technologies are inevitable for the microelectronic research and industry – this book explains how!.First English edition of the successful, corresponding German book.Includes supplementary mat | | 图书封面 |  | | 描述 | Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready passed the boundary of 100 nm, decorative surface treatment will happen 2 in the mm range, and the upper limit is reached with surface protecting layers of windows which are coated with ?/4 layers against IR radiation. The rapid development of the semiconductor industry is inconceivable wi- outthegiantprogressintheplasmatechnology.Moore’slawisnotcarvedinto 1 stone, and not only the ITRS map is subject to change every ?ve years but also new branches develop and others mingle together. Moreover, the quality of conventional materials can be improved by plasma treatment:Cottonbecomesmorecrease-resistant,leathermoredurable,andthe shrinking of wool ?bers during the washing process can be signi?cantly reduced. To cut a long story short: More than 150 years after the discovery of the sputtering e?ect | | 出版日期 | Book 20091st edition | | 关键词 | Cross section; Diagnostics; Discharges; Etching; Ion Beam; Microelectronics; Nanoelectronics; Nanoimprint; S | | 版次 | 1 | | doi | https://doi.org/10.1007/978-3-540-85849-2 | | isbn_softcover | 978-3-642-09939-7 | | isbn_ebook | 978-3-540-85849-2 | | copyright | Springer-Verlag Berlin Heidelberg 2009 |
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发表于 2025-3-21 20:08:13
