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Titlebook: Interconnect Noise Optimization in Nanometer Technologies; Mohamed A. Elgamel,Magdy A. Bayoumi Book 2006 Springer-Verlag US 2006 3D.CAD.al

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书目名称Interconnect Noise Optimization in Nanometer Technologies
编辑Mohamed A. Elgamel,Magdy A. Bayoumi
视频videohttp://file.papertrans.cn/471/470685/470685.mp4
概述Presents a range of CAD algorithms and techniques for synthesizing and optimizing interconnect.Provides insight and intuition into layout analysis and optimization for interconnect in high speed, high
图书封面Titlebook: Interconnect Noise Optimization in Nanometer Technologies;  Mohamed A. Elgamel,Magdy A. Bayoumi Book 2006 Springer-Verlag US 2006 3D.CAD.al
描述.Interconnect has become the dominating factor in determining system performance in nanometer technologies. Dedicated to this subject, Interconnect Noise Optimization in Nanometer Technologies provides insight and intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits...The authors bring together a wealth of information presenting a range of CAD algorithms and techniques for synthesizing and optimizing interconnect. Practical aspects of the algorithms and the models are explained with sufficient details. The book investigates the most effective parameters in layout optimization. Different post-layout optimization techniques with complexity analysis and benchmarks tests are provided. The impact crosstalk noise and coupling on the wire delay is analyzed. Parameters that affect signal integrity are also considered..
出版日期Book 2006
关键词3D; CAD; algorithms; complexity; computer-aided design (CAD); integrated circuit; layout; metal-oxide-semic
版次1
doihttps://doi.org/10.1007/0-387-29366-3
isbn_softcover978-1-4419-3844-2
isbn_ebook978-0-387-29366-0
copyrightSpringer-Verlag US 2006
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