Titlebook: Integrated Optics; Proceedings of the T Hans-Peter J. Nolting,Reinhard Ulrich Conference proceedings 1985 Springer-Verlag Berlin Heidelberg

JOT

Applications of Electron Beam Lithography to Integrated Optics1.5 microns, stripe guides have widths between 2 and 8 microns and to ensure low scattering losses must have very smooth edges (0.1μm or better for spatial frequencies between 0.1 and 10μm.). Compared with patterns used in integrated electronic circuits, the ones employed in integrated optics are sp

死亡率

FLUSH

Foment

critique

ALLEY

jealousy

印第安人

慢慢冲刷

Laser Beam Photolithographic System for Integrated Optics ApplicationsA photolithographic system was operated based on direct laser beam explosure of photoresist films. Lineshape dependence on various fabrication parameters is reported.

果核

Laser Induced Chemical Vapor Deposition of Metals for Electrical Contacts in Semiconductor ProcessinPyrolytic and photolytic laser chemical vapor deposition of copper, platinum, gallium and tin is studied for the production of low resistance ohmic contacts of very small dimensions.