Titlebook: High Energy Density Technologies in Materials Science; Proceedings of the 2 F. Garbassi,E. Occhiello Conference proceedings 1990 Kluwer Aca

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Kinetic Aspect of PACVD Modelingfree radical species, based on the ambipolar approximation for glow discharges, is applied to the deposition of silicon nitride from silane and ammonia, the model results are compared with experimental data obtained by an Advanced Semiconductor Materials reactor named Plasma Enhanced CVD III.

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E. Occhiello,F. GarbassiCournot’s concept of chance or contingency, which he developed initially in the ., comes to the aid of his interpretation of the evolution of human societies, which he subjected to a detailed treatment in the . and then in the ..

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Materials Processing with Pulsed Electron BeamPulsed electron beam applications for materials processing are described. In particular, we review and discuss the relevant results obtained in our laboratory in the fields of synthesis of metal silicides, silicon carbide and alloying of immiscible metals.

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978-94-010-6710-2Kluwer Academic Publishers 1990

TSH582