Titlebook: Handbook of Thin Film Technology; Hartmut Frey,Hamid R. Khan Book 2015 Springer-Verlag Berlin Heidelberg 2015 Coating characterization.Coa

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Chemical Vapor Deposition (CVD),nd at atmospheric pressure. Amorphous, polycrystalline, epitaxial, and uniaxially oriented polycrystalline films can be deposited with a high degree of purity. Aspects of CVD include the chemical reactions involved, the thermodynamics and kinetics of the reactors, and the transport of material and energy to and from the reaction site.

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Insitu Measurements,. Its intensity depends, among other things, on the electrical conductivity of the material, in which the eddy currents are induced. Over the connection of the electrical conductivity of the film with the attenuation of the primary magnetic field the film thickness can be determined.

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Book 2015l, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films..

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https://doi.org/10.1007/978-3-642-05430-3Coating characterization; Coatings; Film characterization; Film deposition techniques; Thin layers