| 书目名称 | Fundamentals ofNanoscale Film Analysis | | 编辑 | Terry L. Alford,Leonard C. Feldman,James W. Mayer | | 视频video | | | 概述 | Comprehensively treats the major characterization techniques used to analyze thin films from the micro- to nanoscale.Incorporates the use of x-ray fluorescence (XRF) in thin film analysis.Focuses on s | | 图书封面 |  | | 描述 | .Modern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. .Fundamentals of Nanoscale. .Film Analysis. concentrates on analysis of the structure and composition of the surface and the outer few tens to hundred nanometers in depth. It describes characterization techniques to quantify the structure, composition and depth distribution of materials with the use of energetic particles and photons...The book describes the fundamentals of materials characterization from the standpoint of the incident photons or particles which interrogate nanoscale structures. These induced reactions lead to the emission of a variety of detected of particles and photons. It is the energy and intensity of the detected beams that is the basis of the characterization of the materials. The array of experimental techniques used in nanoscale materials analysis covers a wide range of incident particle and detected beam interactions...Included are such important interactions as atomic collisions, Rutherford backscattering, ion channel | | 出版日期 | Textbook 2007 | | 关键词 | EXAFS; REM; diffraction; electron diffraction; integrated circuit; microscopy; spectroscopy | | 版次 | 1 | | doi | https://doi.org/10.1007/978-0-387-29261-8 | | isbn_softcover | 978-1-4419-3980-7 | | isbn_ebook | 978-0-387-29261-8 | | copyright | Springer-Verlag US 2007 |
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发表于 2025-3-21 16:45:29
