| 期刊全称 | PLASMA CHEMISTRY AND PLASMA PROCESSING | | 期刊简称 | PLASMA CHEM PLASMA P | | 影响因子2024 | 2.613 | | 视频video | | | ISSN | 0272-4324 | | eISSN | 1572-8986 | | 出版商 | SPRINGER | | 发行地址 | ONE NEW YORK PLAZA, SUITE 4600 , NEW YORK, United States, NY, 10004 | | 学科分类 | 1.Science Citation Index Expanded (SCIE)--Engineering, Chemical | Physics, Applied | Physics, Fluids & Plasmas; 2.Current Contents Electronics & Telecommunications Collection--Chemistry & Physics, Pure & Applied; 3.Current Contents Engineering, Computing & Technology--Chemical Engineering; 4.Current Contents Physical, Chemical & Earth Sciences--Physical Chemistry/Chemical Physics; 5.Essential Science Indicators--Chemistry; | | 出版语言 | English |
The information of publication is updating
|
|
发表于 2025-3-21 16:57:56
