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Titlebook: Collective Diffusion on Surfaces: Correlation Effects and Adatom Interactions; Proceedings of the N M. C. Tringides,Z. Chvoj Conference pro

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Dynamics of Interacting Adparticles Under Non-Equilibrium Conditions,m conditions, characterized in particular by the strong gradient of coverage. Our contribution is based on calculations of dynamic structure factor, with Mori’s projection operator method being used to determine .(.). It was shown that the diffusion coefficient depends on the state of the system, ev
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Study of Non-Equilibrium Surface Diffusion from an Initial Step-Concentration Profile with a New Prtand the role of adsorbate-adsorbate interactions. We use a new kinetic algorithm based on the probability .(.) to find a particle at site . in time .. This probability is a measure of the local concentration. The main advantage of this method over standard Monte Carlo methods is the parallel update
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Diffusion on and , Surfaces: The Atomic Slide Puzzle,r from static, even at temperatures as low as room temperature. We make the motion visible of the atoms . a Cu(OO1) terrace, by embedding a low density of In atoms in the first Cu layer. The peculiar characteristics of the motion of the In show that the diffusion of surface vacancies is responsible
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Decay of Two-Dimensional Islands on Ag(110),copy. Contrary to predictions from traditional Ostwald ripening theory, a quasi-one-dimensional (1D) decay mode was observed at low temperatures (175–220 K). A surprisingly sharp transition to the quasi-2D decay mode was observed around 220 K. This transition was accompanied by a fast equilibration
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Detonation of Gas-Particle Flow,(ID) wires connecting the particular elements. Both these tasks are associated with the well-known physical phenomenon of surface diffusion, which is the limit to further miniaturization [.]. Surprisingly, there are not many experimental data available for the diffusion of metals on silicon surfaces at . coverage [.].
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Experimental Aspects of Metal Particle Diffusion on a Silicon Surface,(ID) wires connecting the particular elements. Both these tasks are associated with the well-known physical phenomenon of surface diffusion, which is the limit to further miniaturization [.]. Surprisingly, there are not many experimental data available for the diffusion of metals on silicon surfaces at . coverage [.].
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