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Titlebook: Cohesive Properties of Semiconductors under Laser Irradiation; Lucien D. Laude (Professor of Solid State Physics) Book 1983 Martinus Nijho

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Signalling in the Nervous Systemface layer during solidification. It leads to a slowing down of the thermal diffusion by about five orders of magnitude relative to the melt. The model and the experiments lead to a thickness of the interface layer of a few µm. Universal laws for free and directional solidification are proposed on t
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Central Coding in the Somatic Senseslicon with the theory of transient nucleation[ 1] . The phenomena has been observed [ 2,3] in a temperature range of 660–678 K in germanium and of 833–873 K in silicon. Before the steady state regime, a transient period of duration τ occurs. We determine an expression for τ and show that it is therm
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Signalling in the Nervous Systemious phases of silicon : ion-implanted layers (which are amorphous), crystal and liquid. Most authors believe that during laser annealing the surface layer melts and recrystallizes in times of order of hundreds of nanoseconds, i.e. short enough to avoid diffusion of dopants.
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https://doi.org/10.1007/978-1-4471-1392-8equilibrium carrier dynamics and active nonlinearities in crystalline germanium at excitation levels approaching damage. An investigation of the dynamics of the Moss-Burstein shift of the absorption edge allows the identification of the onset of intervalence-band absorption, indicates a slow carrier
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Treatment of Interstitial Cystitis 1 J/cm.) laser pulse. In ion-implantation-amorphized Si the onset of recrystallization is clearly characterized by the appearance of a sharp Raman feature near 520 cm. well within the first 50 nsec. We find no Raman line during the laser-induced high reflectivity period in either crystalline or amo
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Treatment of Interstitial Cystitistion is quite negligible. The same can be shown to be true for pulsed laser sputtering. By considering the non-thermal mechanisms by which laser irradiation causes atoms and ions to be sputtered from the surface, we may gain a better understanding of pulsed beam annealing. In particular, it is noted
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