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Titlebook: Chemical Vapour Deposition; An Integrated Engine Yongdong Xu,Xiu-Tian Yan Book 2010 Springer-Verlag London 2010 Chemical Vapor Deposition (

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发表于 2025-3-21 17:10:19 | 显示全部楼层 |阅读模式
书目名称Chemical Vapour Deposition
副标题An Integrated Engine
编辑Yongdong Xu,Xiu-Tian Yan
视频videohttp://file.papertrans.cn/225/224465/224465.mp4
概述Introduces the latest research and technological developments, techniques, and driving factors behind chemical vapor deposition (CVD).Includes supplementary material:
丛书名称Engineering Materials and Processes
图书封面Titlebook: Chemical Vapour Deposition; An Integrated Engine Yongdong Xu,Xiu-Tian Yan Book 2010 Springer-Verlag London 2010 Chemical Vapor Deposition (
描述."Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" focuses on the application of this technology to engineering coatings and, in particular, to the manufacture of high performance materials, such as fibre reinforced ceramic composite materials, for structural applications at high temperatures. ..This book aims to provide a thorough exploration of the design and applications of advanced materials, and their manufacture in engineering. From physical fundamentals and principles, to optimization of processing parameters and other current practices, this book is designed to guide readers through the development of both high performance materials and the design of CVD systems to manufacture such materials..."Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" introduces integrated design and manufacture of advanced materials to researchers, industrial practitioners, postgraduates and senior undergraduate students..
出版日期Book 2010
关键词Chemical Vapor Deposition (CVD); Chemical Vapor Infiltration (CVI); Engineering Design; High Performanc
版次1
doihttps://doi.org/10.1007/978-1-84882-894-0
isbn_softcover978-1-4471-2550-1
isbn_ebook978-1-84882-894-0Series ISSN 1619-0181 Series E-ISSN 2365-0761
issn_series 1619-0181
copyrightSpringer-Verlag London 2010
The information of publication is updating

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发表于 2025-3-21 22:31:02 | 显示全部楼层
Physical Fundamentals of Chemical Vapour Deposition,o these techniques are introduced to enable a thorough theoretical understanding of the phenomena occurring in a CVD process and the process control parameters. The topics introduced in this chapter include basic gas laws and kinetic theory, vacuum technology, gas transport phenomena and vapour pres
发表于 2025-3-22 00:54:37 | 显示全部楼层
Thermodynamics and Kinetics of Chemical Vapour Deposition, high quality of a CVD coating it is essential to determine the feasibility of a particular CVD reaction first, then select the suitable precursors for the CVD processes. CVD phase diagrams are derived based on the minimisation of Gibbs free energy and are useful in predicting the equilibrium phases
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Microstructure Evolution and Process Control,tant species and reaction paths during a CVD process at high temperature by experimental methods. Meanwhile, various physical and chemical phenomena are involved in the deposition process. For a CVD process, these phenomena include [1]: (1) heat transfer from the heating element to the substrate to
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发表于 2025-3-22 21:19:15 | 显示全部楼层
Physical Fundamentals of Chemical Vapour Deposition,o these techniques are introduced to enable a thorough theoretical understanding of the phenomena occurring in a CVD process and the process control parameters. The topics introduced in this chapter include basic gas laws and kinetic theory, vacuum technology, gas transport phenomena and vapour pressures of some commonly used CVD reactant gases.
发表于 2025-3-23 01:43:17 | 显示全部楼层
Yongdong Xu,Xiu-Tian YanIntroduces the latest research and technological developments, techniques, and driving factors behind chemical vapor deposition (CVD).Includes supplementary material:
发表于 2025-3-23 06:20:56 | 显示全部楼层
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