Titlebook: Atomic Diffusion in Semiconductors; D. Shaw Book 1973 Plenum Publishing Company Ltd 1973 crystal.diffusion.semiconductor

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STENT

Diffusion in Silicon and Germanium,sion steps. The current state of the art of diffusion processes in the fabrication of integrated circuits relies on an empirical approach with trial and error. The difficulty of such an approach will increase exponentially with the increase of the number of diffusion steps, and a semiempirical appro

exophthalmos

,Diffusion in the III–V Compound Semiconductors,n the band structure [1]. The varied band structures and large range of energy gaps possible with the III–V compounds have led to many potential applications. The crystal structure, lattice constant, type of energy gap, and the room temperature energy gap are summarized in Table 6.1 for the elementa

老巫婆

Book 1973 germane to understanding the atomic mechanisms responsible for diffusion in semiconductors has been published. The object of the present book is to give an account of, and to consolidate, present knowledge of semiconductor diffusion in terms of basic concepts of atomic migration in crystalline latt

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much work germane to understanding the atomic mechanisms responsible for diffusion in semiconductors has been published. The object of the present book is to give an account of, and to consolidate, present knowledge of semiconductor diffusion in terms of basic concepts of atomic migration in crystalline latt978-1-4615-8638-8978-1-4615-8636-4

殖民地

hypotension

Crohns-disease

Fuzzy Implications from Uninormsn the band structure [1]. The varied band structures and large range of energy gaps possible with the III–V compounds have led to many potential applications. The crystal structure, lattice constant, type of energy gap, and the room temperature energy gap are summarized in Table 6.1 for the elementa

TAP

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Fuzzy Predicate Calculus and Fuzzy Rules, atomic motion in semiconducting materials. This theoretical work, aside from being of intrinsic interest, has some utility for individuals interested in experimental phenomena. Firstly, the calculations provide a means for estimating diffusion properties for systems which have not been studied or f