喝水 发表于 2025-3-21 17:32:19

        SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(20 21 REV HIST)影响因子<br>        http://figure.impactfactor.cn/if/?ISSN=0894-6507<br><br>        SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(IEEE T SEMICONDUCT M)影响因子@(工程，电气和电子)学科排名<br>        http://figure.impactfactor.cn/ifr/?ISSN=0894D6507<br><br>        SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(20 21 REV HIST)总引论文<br>        http://figure.impactfactor.cn/at/?ISSN=0894-6507<br><br>        SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(IEEE T SEMICONDUCT M)总引论文@(工程，电气和电子)学科排名<br>        http://figure.impactfactor.cn/atr/?ISSN=0894D6507<br><br>        SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(20 21 REV HIST)影响因子<br>        http://figure.impactfactor.cn/tc/?ISSN=0894-6507<br><br>        SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(IEEE T SEMICONDUCT M)总引频次@(工程，电气和电子)学科排名<br>        http://figure.impactfactor.cn/tcr/?ISSN=0894D6507<br><br>        SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(20 21 REV HIST)即时影响因子<br>        http://figure.impactfactor.cn/ii/?ISSN=0894-6507<br><br>        SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(IEEE T SEMICONDUCT M)即时影响因子@(工程，电气和电子)学科排名<br>        http://figure.impactfactor.cn/iir/?ISSN=0894D6507<br><br>        SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(20 21 REV HIST)五年累积影响因子<br>        http://figure.impactfactor.cn/5y/?ISSN=0894-6507<br><br>        SCIE(SCI)期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING(IEEE T SEMICONDUCT M)五年累积影响因子@(工程，电气和电子)学科排名<br>        http://figure.impactfactor.cn/5yr/?ISSN=0894D6507<br><br>       

Radiculopathy 发表于 2025-3-21 21:47:12

Submitted on: 29 August 2006.
Revised on: 07 December 2006.
Accepted on: 23 December 2006.

___________________IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING

eczema 发表于 2025-3-22 03:44:57

http://reply.papertrans.cn/2/121/12076/12076-3.png

疾驰 发表于 2025-3-22 05:48:26

http://reply.papertrans.cn/2/121/12076/12076-4.png

大范围流行 发表于 2025-3-22 10:40:46

http://reply.papertrans.cn/2/121/12076/12076-5.png

补充 发表于 2025-3-22 16:27:28

http://reply.papertrans.cn/2/121/12076/12076-6.png

DOLT 发表于 2025-3-22 17:02:34

http://reply.papertrans.cn/2/121/12076/12076-7.png

改革运动 发表于 2025-3-22 21:33:39

http://reply.papertrans.cn/2/121/12076/12076-8.png

manifestation 发表于 2025-3-23 01:27:13

Submitted on: 31 March 2006.
Revised on: 13 June 2006.
Accepted on: 10 July 2006.

___________________IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING

deriver 发表于 2025-3-23 06:59:42

Submitted on: 07 May 2022.
Revised on: 24 July 2022.
Accepted on: 05 August 2022.

___________________IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
页: [1] 2 3 4
查看完整版本: SCIE期刊IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 2024/2025影响因子:2.332 (IEEE T SEMICONDUCT M) (0894-6507). (ENGINEE